7.5 credits cr.
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In this course you will study the physics behind nanotechnology. You will learn about research within the field as well as development of processes and materials within micro/nanotechnology.
Microelectronics has had tremendous development during last decades broadening the field of applications in many directions. Miniaturization is a driving force for an astounding progress of microelectronics. For the last four decades the undergoing technical revolution in microelectronics is well described by “Moore’s law”, according to which, every 3 years a new generation of integrated circuits appears, in which the number of components on the chip increases 4 times (or doubles every 18 months). Such a remarkable rate of miniaturization was demanded by industry, because the reduction of dimensions went hand-in-hand with an increase in performance and a decrease in the cost of the device. Modern integrated circuits may contain several milliards transistors with a minimum feature size less than 100 nanometers (0.1 micrometers). This would not have been possible without development of thin film technology, nanoprocessing, and material science. A great many sophisticated instruments and techniques, developed to process and characterize thin films and surfaces, have already become indispensable in virtually every research area and high-tech industry. While the major exploitation of thin films is associated with microelectronics, there are numerous and growing novel applications in communication, optical electronics, energetics, coating, data storage, etc. The existing microtechnology is approaching its physical limit and major technological breakthroughs in terms of processes and materials will be required in a near future, as device sizes decrease below ~45 nm, ie., in a new-born area of nanoelectronics. Further development requires a continuous search for new materials advanced methods of deposition, nanoprocessing and characterization of thin films. This challenging task would require specialists with a full knowledge of a huge experience, accumulated in microfabrication technique and in related material and fundamental research areas.
The course aims at giving a basic knowledge of various micro/nano fabrication processes, thin film materials, characterization techniques and emerging applications used in modern micro/nano-electronics, optics and micromachining. The goal is to learn material science aspects and physical principles of nanoscale technology, which will help students to understand the link between Processing-Structure-Properties-Performance of thin film devices and to be capable of choosing proper materials, deposition and characterization techniques for a given task. The course will make an overview over an actual research and development and most recent trends in nanoscale technology and will provide a basis for further studies at the undergraduate and postgraduate level, diploma work and professional preparation.
This is a second cycle course. This course can also be taken as a third cycle course.
The course will be given in English.
The teaching and learning activities are lectures, exercises, and mandatory laboratory sessions.
The examination consists of a written exam as well as reports of home work problems and a litterature project.
Phone: +468 553 786 06
ScheduleThe schedule will be available no later than one month before the start of the course. We do not recommend print-outs as changes can occur. At the start of the course, your department will advise where you can find your schedule during the course.
Note that the course literature can be changed up to two months before the start of the course.
The Materials Science of Thin Films by Milton Ohring
Course coordinator and teacher:
Vladimir Krasnov, phone: +468 553 786 06, e-mail: email@example.com
Roger Cattaneo, phone: +468 5537 8629, e-mail: firstname.lastname@example.org
Taras Golod, phone: +468 553 786 11, e-mail: email@example.com
Academic advisor at the Department of Physics: firstname.lastname@example.org
Student office: email@example.com